A team led by Prof. Sun Haiding from the University of Science and Technology of China (USTC) developed a vertically integrated micro-scale light-emitting diode (micro-LED) array which was then applied in deep ultraviolet (DUV) maskless photolithography system for the first time. Their study was published in Laser & Photonics Reviews. A team led by Prof. Sun Haiding from the University of Science and Technology of China (USTC) developed a vertically integrated micro-scale light-emitting diode (micro-LED) array which was then applied in deep ultraviolet (DUV) maskless photolithography system for the first time. Their study was published in Laser & Photonics Reviews. Optics & Photonics Phys.org – latest science and technology news stories
New deep ultraviolet micro-LED array advances maskless photolithography
